Rapid prototyping for R&D
Advanced and novel nanodevices demand precise control of size, shape, and position of the involved nanostructures. New substrates, resists, materials and complex geometries with small feature sizes are often required. In R&D these “parameters” have to be iteratively adapted to optimized device properties. Therefore one tries to keep iterations short in order to accelerate scientific progress. For example, mask-less technologies are already very successful in decreasing complexity, production time and costs.
The mask-less NanoFrazor technology is particularly suited for prototyping in research and development due to its general applicability to various materials and surfaces. But it goes even a few steps further: As no resist development or optical proximity corrections are required, time can be saved and complexity can be reduced. The in-situ metrology capabilities allow for an instantaneous feedback and real-time adjustments on the written nanostructures for a greatly reduced turnaround time compared to e-beam lithography. Using underlying features for marker-less overlay saves time for creating the markers and allows for a high alignment accuracy.