McGill University, Montréal, Canada

“The McGill Nanotools Microfab was the first facility to order a NanoFrazor. We immediately recognized the huge potential of this young technology with its combined patterning and imaging capability. The resulting accurate 3D patterning is used at McGill for example for optical grating couplers with enhanced efficiency. The fact that the NanoFrazor does not use charged particle beams like most conventional nanolithography methods is another exciting feature we intend to benefit from when fabricating e.g. electrodes on sensitive materials. Furthermore, high resolution nanostructures can be fabricated for example with lift-off with very little effort by our students, which is also important for us an educational institution.”

Prof. Dr. Peter Grütter, Chair, Department of Physics, McGill University Montréal, Canada

Watch a video with Matthieu Nannini, manager of the McGill Nanotools Microfab, showing the NanoFrazor and telling you what they are doing with it at McGill University.

EPFL Lausanne, Switzerland

The tool is installed in the Microsystems Laboratory 1, and is being used for first exciting applications. Furthermore, SwissLitho and the EPFL are collaborating on increasing the patterning depth range of the NanoFrazor to typical MEMS dimensions within the framework of the Swiss CTI project “Nano2Micro”.

“In my own group, researchers use a multitude of nanofabrication methods. Apart from simplification, the precise 3D functionality of the NanoFrazor opens a significant amount of new possibilities for new devices, which currently cannot be produced with any other technology. At the EPFL, there are also other groups that have great interest in the machine. I see direct applications for nano- and microoptical elements, nanoelectronics and fabrication of stamps for nanoimprint lithography. But also for self-organization of nanoparticles and material structuring and characterization on the nanoscale.” 

Prof. Dr. Jürgen Brugger, Head of LMIS1, EPFL Lausanne, Switzerland

IBM Research Zurich, Switzerland

“The driving force to develop the t-SPL or NanoFrazor technology was always to create a novel approach for nanoscale lithography that addresses important patterning challenges for many research communities. Most prominently, the in-situ imaging capabilities of the tool paved the way for the online parameter optimization, the precise overlay and stitching capabilities, and the closed loop patterning feedback for nm precise 3D patterning. At IBM we actively exploit these options to build unique high resolution solid state devices and novel nanofluidic devices that allow us to control and transport nanoscale objects with unprecedented precision. I am convinced that this technology also in the future will further nucleate exciting ideas for novel devices.”

Dr. Armin Knoll, group leader nanofabrication, IBM Research-Zurich, Switzerland

ETH Zurich, Switzerland

The NanoFrazor of the ETH Zurich is installed in the clean room of the Binnig and Rohrer Nanotechnology Center.

“The NanoFrazor extends our possibilities for the fabrication of novel photonic devices for data communication using silicon photonics. Besides high resolution, we see exciting opportunities using the unique overlay and 3D patterning capabilities. These possibilities are essential for various devices we have in mind.”

Prof. Dr. Juerg Leuthold, Head of Electromagnetic Fields Laboratory, ETH Zurich, Switzerland

Air Force Research Laboratory, Dayton, OH, USA

“U.S. Air Force Research Laboratory, Sensors Directorate purchasing SwissLitho NanoFrazor Explore nanolithography tool: Part of AFRL’s Sensors Directorate mission is to ensure unequaled reconnaissance, surveillance, precision engagement, and electronic warfare capabilities for America’s Air and Space Forces by developing, demonstrating and transitioning advanced sensors and sensor technologies. This research tool will be utilized in the performance of basic and applied research to discover and develop novel optoelectronic, laser, and power electronic concepts. Additionally it will be utilized in the performance of basic and applied research on emerging EO/IR sensing technologies and components to understand and exploit nanotechnology and metamaterials to provide accurate, fast, and inexpensive sensing options to meet future requirements for highly contested environments. The NanoFrazor will also be used to foster and support collaborative research efforts with the Materials & Manufacturing Directorate’s Functional Materials Division whose mission involves research in nanoelectronic and photonic materials. Many of the specific research tasks planned for the tool are supported by AFRL’s AF Office of Scientific Research Directorate (AFOSR) through intramural research projects. This acquisition will enhance the Sensors Directorate’s capabilities in nanoscale lithography by augmenting existing e-beam lithography capabilities while providing an additional capability for 3D lithography.”

Official statement AFRL, Dayton, OH, USA

Beihang University, Beijing, China

“We are looking forward to using this new lithography technology to fabricate our high-resolution magnetic tunnel junction (MTJ) and the lateral spin valve (LSV) devices. Experiments are planned not only for the nano-fabrication but also for the topography imaging on certain samples. The lack of proximity effects using the NanoFrazor will give us a big advantage in fabricating our devices. Some other groups in the institute also plan to use the tool for their research. I believe the ease of fabrication of high-resolution nanodevices with the NanoFrazor will encourage our students to use the instrument more and learn better during the experiments.”

Prof. Dr. Weisheng Zhao, Head of Fert Beijing Institute, Beihang University, China

Melbourne Centre for Nanofabrication, Victoria, Australia

“Access to this new technology opens up many possibilities for ANFF researchers. The 3D capability of NanoFrazor to pattern resist materials is very appealing to the community working on flat-optical elements and phase masks. Other areas where I can see the Nanofrazor having an impact include patterning nano-membranes with sub-10nm nano-holes for water and gas sensing. My team in particular will be looking at ways to fabricate high-electron-mobility transistors (HEMTs) for use as emitters and detectors in terahertz (T-ray) devices which has the potential to open up new applications in medical imaging.”

Prof. Dr. Saulius Juodkazis, Swinburne University, Australia

CUNY Adanced Science Research Center, and The City College of New York, USA

The NanoFrazor has been installed in the PicoForce Lab, in the new CUNY ASRC center in New York City. The NanoFrazor was acquired by means of a NSF MRI grant.

Recently in our lab we have shown that hot nano-tips can be used to activate chemical reactions at surfaces leading to controlled patterns of ad-hoc surface chemistry. This thermochemical nanolithography (TCNL) method has been used to reduce oxides (e.g. graphene oxide), locally crystallize sol-gel precursor films of piezoelectric ceramics, generate proteins/DNA arrays with 10 nm-resolution and concentration gradients of proteins with sub-100 nm resolution, fabricate magnetic nanopatterns and PPV wires.

I believe that the acquisition of the user-friendly NanoFrazor with its new technologies for 3D patterning of soft and unconventional materials with sub-10 nm resolution, high writing speeds, and marker-free overlay/stitching, combined with our expertise in TCNL and the large scientific collaborative community of the ASRC, will lead to the development of new innovative nanostructures, nano-devices, and nanofabrication concepts, with potential transformative applications in nanoelectronics, nanomagnetism, nanophotonics, catalysis and biomedicine.”

Prof. Dr. Elisa Riedo, The City University of New York, and The City College of New York, USA

The University of Utah, Salt Lake City, USA

“The NanoFrazor Explore is opening a larger range of opportunities for the University of Utah’s Nanofab. My team will be looking at performing aggressive lithography and alignment on semiconductor nanowire with a degree of simplicity never matched by any other tools. My colleagues and I are also eager to evaluate the capabilities of the tool for patterning 2D materials with very little structural damage. Other outstanding opportunities stand in the exploration of the 3D capability of the tool for all my optics colleagues.”

Prof. Dr. Pierre-Emmanuel Gaillardon, The University of Utah, Salt Lake City, USA