The NanoFrazor technology is well-suited for the fabrication of complex high-resolution masters, which form the basis of high-throughput manufacturing techniques like nanoimprint lithography, photolithography or injection molding.

Nanoimprint lithography (NIL) is an emerging high-throughput nanolithography technique. It requires stamps whose patterns are almost identically replicated in a resist by either thermal imprinting (T-NIL) or UV curing (UV-NIL). Even complex 3D-structures can be mass-manufactured from 3D stamps. PDMS-like soft stamps for UV-NIL can be patterned  by Thermal Scanning Probe Lithography. Materials commonly used for T-NIL, such as such as silicon, nickel and quartz can be used as substrates for pattern transfer. A very simple approach has been demonstrated in collaboration with EV Group using their SmartNILTM process, whereby the SmartNIL stamp was cast directly from a PPA film patterned by the NanoFrazor Explore.

Low-resolution photolithography masks are usually fabricated by laser writers which achieve high throughput at reasonable cost. For high-resolution masks, which are fabricated by e-beam lithography, challenges like throughput, placement accuracy and critical dimension increase dramatically, also requiring optical proximity correction (OPC). OPC can be improved by introducing 3D features to the mask, making it suitable target market for the NanoFrazor Industrial. A further advantage of the NanoFrazor technology is its in-situ inspection capability, which can potentially save some of the expensive metrology steps during the mask-making process.

Injection Molding is the most common technique for mass-manufacturing of any kind of plastic parts. It is less known for nanotechnology, even though it is also capable of replicating nanostructures. Like nanoimprint lithography, injection molding is capable of replicating 3D-nanostructures.

The NanoFrazor Explore offers unique capabilities for this mass manufacturing process, e.g. to incorporate 3D nanostructures into plastic parts. This has been demonstrated in collaboration with the company applied microSWISS and the Fachhochschule Nordwestschweiz (FHNW). A 3D pattern was transferred to a Si wafer, which was then electroplated, and the resulting nickel shim was used to replicate this 3D nanostructures into PMMA using vario-thermal injection compression molding .