Matthias Schirmer was born on 29 July 1954 in Halle/Saale, Germany. After high school graduation in 1975, he studied chemistry at the Humboldt University in Berlin. He completed his studies in 1980 with the diploma thesis “Derivatives of Azido Meldrum’s acid for the development of Deep-UV-photoresists” in the working group “Organic Chemistry” of Prof. G. Tomaschewski at the Humboldt University.
In September 1980, he started to work as research assistant in the Fotochemische Werke Berlin (FCW). Matthias Schirmer was significantly involved in the development of new e-beam resists in cooperation with the Academy of Sciences Berlin Adlershof, Central Institute of Organic chemistry, lead by Prof. Dr. Lorkowski, and assumed in 1990 the management of the R & D department of the FCW.
In 1983, Matthias Schirmer married the chemical engineer Brigitte Schirmer. They raised three children together.
As a result of the reunification of Germany, the photoresist section of the FCW was closed in 1992. On 16 October 1992, Matthias and Brigitte Schirmer founded the Allresist GmbH in Berlin, taking over eight former FCW employees and the entire expertise of resist research. In 1999, a new location for the constantly increasing production was searched for and found in Strausberg near Berlin. The new and modern, 1000 m² large building offered all prerequisites for resist production and research.
Matthias Schirmer was mainly responsible for many resist developments. The “multiprocessing resist” (a multifunctional e-beam resist, 1995), the negative photoresist “CAR 44″ (2005), the positive e-beam resist “CSAR 62” (2013) and “Electra 92”, a conductive resist for e-beam lithography (2015) were important achievements of his research.